Introduce CVD principle

Chemical vapor deposition is a method of preparation of materials of the gas phase growth, it is to put one or more of the following contains a membrane element compounds, elemental gas bubbled into place the reaction chamber with base material, with the gas phase chemical reactions on the substrate surface deposition process technology of solid membrane.CVD (Chemical vapor deposition, or CVD) is the material in the gas phase reaction conditions are issued by biochemical reaction, generate solids deposition on the surface of the solid substrate that heating, which made of solid material technology.It essentially belong to the category of atomic gas mass transfer process.As opposed to a physical vapor deposition (PVD).